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Physical Characteristics of TiOx Thin Films Obtained by DC Reactive Sputtering

VICTOR CARNEIRO LIMA 1 ; IOSHIAKI DOI 1 ; Jose Alexandre Diniz 2 ; RODRIGO REIGOTA CESAR 2
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This work presents the results of the physical characterization of TiOx thin films obtained under different deposition conditions such as O2/Ar ratio and deposition plasma power using dc reactive sputtering process in order to determine effects of such contiditions in the characteristics of the films.